Systems for discretized processing of regions of a substrate

ABSTRACT

The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

RELATED APPLICATION

This application claims the benefit of U.S. patent application Ser. No.60/725,186, filed Oct. 11, 2005.

FIELD OF THE INVENTION

This invention relates to the combinatorial processing of regions of asubstrate, including thin film processing methods used in themanufacture of integrated circuits, semiconductor devices, flat paneldisplays, optoelectronic devices, data storage devices,magnetoelectronic devices, magnetooptic devices, molecular electronicdevices, solar cells, photonic devices, packaged devices, and the like.In particular, the invention relates to discretized, combinatorialprocessing of and combinatorial process sequence integration performedwithin unique regions contained in and/or on a single monolithicsubstrate used in device fabrication.

BACKGROUND OF THE INVENTION

The manufacture of integrated circuits (IC), semiconductor devices, flatpanel displays, optoelectronics devices, data storage devices,magnetoelectronic devices, magnetooptic devices, packaged devices, andthe like entails the integration and sequencing of many unit processingsteps. As an example, IC manufacturing typically includes a series ofprocessing steps such as cleaning, surface preparation, deposition,lithography, patterning, etching, planarization, implantation, thermalannealing, and other related unit processing steps. The precisesequencing and integration of the unit processing steps enables theformation of functional devices meeting desired performance metrics suchas speed, power consumption, and reliability.

The drive towards ever increasing performance of devices or systems ofdevices such as in systems on a chip (SOCs) has led to a dramaticincrease in the complexity of process sequence integration and deviceintegration, or the means by which the collection of unit processingsteps are performed individually and collectively in a particularsequence to yield devices with desired properties and performance. Thisincrease in complexity of device integration has driven the need for,and the subsequent utilization of increasingly complex processingequipment with precisely sequenced process modules to collectivelyperform an effective unit processing step. For example, an advancedintegrated copper barrier and seed deposition tool will include a degasmodule, a preclean module, a barrier deposition module, a seeddeposition module, a cool module, and combinations thereof.Collectively, the integration of precise modules in a precise sequenceallows the copper barrier and seed layers to be deposited effectively.In another example, an advanced copper electroplating tool may include asurface preparation module, an electroplating module, a spin rinse drymodule, a thermal annealing module, and combinations thereof. In yetanother example, an integrated copper chemical mechanical planarization(CMP) tool may include a copper polish module, a barrier polish module,a cleaning module, a rinse/dry module, and combinations thereof.

The precise sequencing of the unit processing tools, in addition to theunit process modules within each tool, must be properly sequenced andintegrated. As an example, for a typical copper interconnect processflow used in IC manufacturing, a monolithic substrate or wafer processedwithin the copper barrier and seed deposition tool is followed bysubsequent processing in a separate electroplating tool to substantiallyform the bulk copper metal deposition and will then be processed in aseparate CMP tool for planarization, which includes the removal ofexcess unwanted bulk copper and barrier layer conductor films.

In addition to the increasingly challenging process sequence integrationrequirements, the tools and equipment employed in device manufacturinghave been developed to enable the processing of ever increasingsubstrate sizes such as the move from 4″ to 6″, to 8″ (or 200 mm), andnow to 12″ (or 300 mm) diameter wafers in order to fit more ICs persubstrate per unit processing step for productivity and cost benefits.Other methods of increasing productivity and decreasing manufacturingcosts have been to use batch reactors whereby multiple monolithicsubstrates can be processed in parallel. A common theme has been toprocess the entire monolithic substrate or batch substrates uniformly,in the same fashion with the same resulting physical, chemical,electrical, and the like properties across the monolithic substrate.

The ability to process uniformly across an entire monolithic substrateand/or across a series of monolithic substrates is advantageous formanufacturing cost effectiveness, repeatability and control when adesired process sequence flow for IC manufacturing has been qualified toprovide devices meeting desired yield and performance specifications.However, processing the entire substrate can be disadvantageous whenoptimizing, qualifying, or investigating new materials, new processes,and/or new process sequence integration schemes, since the entiresubstrate is nominally made the same using the same material(s),process(es), and process sequence integration scheme. Conventional fullwafer uniform processing results in fewer data per substrate, longertimes to accumulate a wide variety of data and higher costs associatedwith obtaining such data.

As part of the discovery, optimization and qualification process, it isdesirable to be able to i) test different materials, ii) test differentprocessing conditions within each unit process module, iii) testdifferent sequencing and integration of processing modules within anintegrated processing tool, iv) test different sequencing of processingtools in executing different process sequence integration flows, andcombinations thereof in the manufacture of devices such as integratedcircuits. In particular, there is a need to be able to test i) more thanone material, ii) more than one processing condition, iii) more than onesequence of processing conditions, iv) more than one process sequenceintegration flow, and combinations thereof, collectively known as“combinatorial process sequence integration”, on a single monolithicsubstrate without the need of consuming the equivalent number ofmonolithic substrates per material(s), processing condition(s),sequence(s) of processing conditions, sequence(s) of processes, andcombinations thereof. This can greatly improve both the speed and reducethe costs associated with the discovery, implementation, optimization,and qualification of material(s), process(es), and process integrationsequence(s) required for manufacturing.

In addition, there is a need to be able to perform such combinatorialprocess sequence integration testing in a fashion whereby a monolithicsubstrate can be previously and/or subsequently processed in a separateprocessing tool(s) within a particular manufacturing flow without theneed to alter or modify the separate processing tool and/or process(es)employed in such separate tool. This serves to preserve the importanceof the sequencing and interaction(s) with prior or subsequentprocess(es) performed in the separate process tool(s). Moreover, thereis a need to be able to perform such combinatorial process sequenceintegration testing without the need for creating a specializedsubstrate to facilitate such combinatorial testing, but instead, toemploy substrates and process flows used directly in the manufacture ofthe desired ICs themselves. This expands upon the more limitedcapability of testing specific materials properties in speciallydesigned isolated situations which do not capture directly how suchmaterials and their processing relate to the subsequent material(s)and/or processing steps, and interactions thereof in the manufacture ofa desired IC or device.

INCORPORATION BY REFERENCE

Each publication, patent, and/or patent application mentioned in thisspecification is herein incorporated by reference in its entirety to thesame extent as if each individual publication, patent, and/or patentapplication was specifically and individually indicated to beincorporated by reference.

SUMMARY OF THE INVENTION

The present invention provides methods and systems for discretized,combinatorial processing of regions of a substrate for such purposesincluding the discovery, implementation, optimization and qualificationof new materials, processes, and process sequence integration schemesused in integrated circuit fabrication. A substrate having an array ofdifferentially processed regions thereon is processed by deliveringmaterials to or modifying regions of the substrate. Processing includesphysical modifications, chemical modifications, electricalmodifications, thermal modifications, magnetic modifications, photonicmodifications, and photolytic modifications, more specifically cleaning,surface modification, surface preparation, deposition, dispensing,reaction, functionalization, etching, planarization, chemical mechanicalplanarization, electrochemical mechanical planarization, lithography,patterning, implantation, irradiation, electromagnetic irradiation,microwave irradiation, radio frequency (RF) irradiation, thermaltreatment, infrared (IR) treatment, ultraviolet (UV) treatment, deepultraviolet (DUV) treatment, extreme ultraviolet (EUV) treatment,electron beam treatment, and x-ray treatment, and more specificallyelectrochemical deposition, electroless deposition, physical vapordeposition, chemical vapor deposition, atomic layer deposition, vaporphase epitaxy, liquid phase epitaxy, chemical beam epitaxy, molecularbeam epitaxy, molecular self-assembly, and evaporation. Once processed,the regions of the substrate can be evaluated for useful propertiesincluding, for example, electrical, thermal, mechanical, morphological,optical, magnetic, chemical and other properties. As such, the presentinvention provides methods and systems for the combinatorial processingand analysis of regions of a substrate. Any processed region found topossess a useful property can be subsequently prepared on a large-scale.

One aspect is directed to a system for processing regions on asubstrate. In one embodiment, the system includes a substrate having anarray of discrete regions, wherein each region comprises a plurality ofstructures and/or devices, and a processing tool adapted to process eachregion of the substrate individually.

In another embodiment, the system includes a substrate having an arrayof regions, and a processing tool adapted to process each region of thesubstrate individually. The processing tool is adapted to perform atleast one of cleaning, surface modification, surface preparation,etching, planarization, patterning, implantation, thermal treatment,infrared (IR) treatment, ultraviolet (UV) treatment, electron beamtreatment, and x-ray treatment.

Another aspect of the present invention is directed to methods forforming an array of differentially processed regions on a substrate. Inone embodiment, the method includes providing a substrate having anarray of predefined regions that are similar to each other, wherein eachregion includes at least two different structures or devices, andprocessing at least a portion of two regions of the substratedifferently from each other by providing a material to at least aportion of each region or modifying at least a portion of each region.

In another embodiment, the method includes providing a substrate, andprocessing at least a portion of two regions of the substratedifferently from each other. The processing includes at least one ofcleaning, surface modification, etching, planarization, patterning,implantation, infrared (IR) treatment, ultraviolet (UV) treatment,electron beam treatment, and x-ray treatment.

In yet another embodiment, the method includes providing a substrate,processing at least a portion of two regions of the substratedifferently from each other and determining a property of the processedregions. The processing includes providing a material to at least aportion of the region or modifying at least a portion of the region. Theproperty includes at least one of yield, leakage, operational frequency,switching speed, mobility, transconductance, drive current, thresholdvoltage, electrical resistance, charge density, stress migration,electromigration, bias thermal stress, and time dependent dielectricbreakdown.

In yet another embodiment, the method includes providing a substratehaving at least two discrete regions and forming layers on some of thediscrete regions. Each of the discrete regions of the substrate includesa dielectric portion and an electrically conductive portion. Thesubstrate of an embodiment can include a sufficient amount of spacebetween the regions such that materials do not substantiallyinterdiffuse between the regions. The method includes forming a maskinglayer on the dielectric portions of some of the discrete regions, butnot on the electrically conductive portions of the discrete regions, andforming a capping layer on the electrically conductive portions of someof the discrete regions, but not on the dielectric portions of theregions. In one embodiment, the masking layers are different from eachother and inhibit formation of material in the dielectric portions ofeach region. In another embodiment, the capping layers are differentfrom each other.

In yet another embodiment, the method includes receiving a substratefrom at least one first process selected from a group consisting ofdepositing, patterning, etching, cleaning, planarizing, and treating andgenerating a processed substrate by processing at least a portion of twoareas of a substrate, the two areas being processed differently fromeach other. The processing includes modifying the portion of two areasusing at least one of a plurality of processes, a process sequence, aplurality of processing conditions, and a plurality of processingsequence conditions, wherein at least one of the processes, processsequence, processing conditions, and processing sequence conditions isdifferent in each of the portion of two areas.

In yet another embodiment, the method includes generating a processedsubstrate by processing at least a portion of two areas of thesubstrate, the two areas being processed differently from each other,and providing the processed substrate to at least one additional processselected from a group consisting of depositing, patterning, etching,cleaning, planarizing, and treating. The processing includes modifyingthe portion of two areas using at least one of a plurality of processes,a process sequence, a plurality of processing conditions, and aplurality of processing sequence conditions, wherein at least one of theprocesses, process sequence, processing conditions, and processingsequence conditions is different in each of the portion of two areas

Another aspect of the present invention is directed to a substratehaving at least two discrete regions. In one embodiment, each regioncomprising an electrically conductive portion and a dielectric portion.The substrate has a capping layer on the electrically conductive portionof at least one of the regions, and a masking layer on the dielectricportion of at least one of the regions. In these embodiments, at leastone of the capping layers in the regions is different from another, orat least one of the masking layers in the regions is different another,or both at least one of the capping layers and at least one of themasking layers in the regions are different from each other.

In another embodiment, the substrate has at least a first and a seconddiscrete region, the first discrete region has at least one areamodified using a first set of process sequences and a first set ofconditions, and the second discrete region has at least one areamodified using a second set of process sequences and a second set ofconditions. At least one process is different between the first andsecond set of process sequences, and at least one condition is differentbetween the first and second set of conditions.

Other features, objects and advantages of the present invention will bein part apparent to those skilled in the art and in part pointed outhereinafter. All references cited in the instant specification areincorporated herein by reference for all purposes. Moreover, as thepatent and non-patent literature relating to the subject matterdisclosed and/or claimed herein is substantial, many relevant referencesare available to a skilled artisan that will provide further instructionwith respect to such subject matter.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a flowchart illustrating a methodology for combinatorialprocess sequence integration in accordance with one embodiment of thepresent invention.

FIG. 1B is a flowchart illustrating a general methodology 100-B forcombinatorial process sequence integration that includes site-isolatedprocessing and/or conventional processing, under an embodiment.

FIG. 1C is a flowchart illustrating a more specific methodology 100-Cfor combinatorial process sequence integration that includessite-isolated processing and/or conventional processing, under anembodiment.

FIG. 2A is a top view of a semiconductor wafer comprising a die arraythat is used in accordance with the principles of one embodiment of thepresent invention. FIG. 2B is a blown-up view of one die of the diearray shown in FIG. 2A. FIG. 2C is a view of the single die of FIG. 2Billustrating a first portion and a second portion of the die.

FIG. 3A illustrates an embodiment of a system of the present inventionfor serial combinatorial process sequence integration of wet processes,such as those used in IC and related manufacturing. FIG. 3B shows aperspective view of the processing tool described in FIG. 3A.

FIG. 4A is a perspective view of an embodiment of a processing cell asused in a processing tool of the present invention. FIG. 4B is a view ofthe processing cell in contact with the substrate after processing fluidhas been delivered to the isolated region of the substrate.

FIG. 5 illustrates an embodiment of a system of the present inventionfor serial combinatorial process sequence integration of wet processes,such as those used in IC and related manufacturing in which theprocessing cell moves from region to region of the substrate.

FIG. 6A is a view of an illustration of a first region of a substratebeing individually processed by the system of the present invention.FIG. 6B is a view of an illustration of the substrate and processingsystem of FIG. 6A, where a second region has been processed after thefirst region. FIG. 6C is a view of an illustration of the substrate andprocessing system of FIGS. 6A and 6B, where all of the regions of thesubstrate have been individually processed.

FIG. 7A is a bottom view of a parallel isolation chamber or unitarystructure of an array of processing cells for use in the processingsystem of an embodiment of the present invention. FIG. 7B is aperspective view of a parallel processing tool incorporating the chamberarray described in FIG. 7A. FIG. 7C illustrates an embodiment of asystem of the present invention for parallel combinatorial processsequence integration of wet processes, such as those used in IC andrelated manufacturing. FIG. 7D illustrates an embodiment of a system ofthe present invention for parallel combinatorial process sequenceintegration of wet processes, utilizing an embodiment of a paralleldispensing device. FIG. 7E illustrates another embodiment of a system ofthe present invention for parallel combinatorial process sequenceintegration of wet processes, utilizing an embodiment of a paralleldispensing device.

FIG. 8 shows a top view of one embodiment for a sealing element for usein one embodiment of the parallel processing tool.

FIG. 9A is a top view of one embodiment of the substrate illustratingregions of a substrate that can be processed with the structure shown inFIG. 7A. FIG. 9B illustrates another embodiment of a configuration forprocessing cells for the parallel processing of regions of a substrate.FIG. 9C is a top view of one embodiment of the substrate illustratingregions of a substrate that can be processed according to theconfiguration of FIG. 9B. FIG. 9D illustrates another embodiment of aconfiguration for processing cells for the parallel processing ofregions of a substrate. FIG. 9E is a top view of one embodiment of thesubstrate illustrating regions of a substrate that can be processedaccording to the configuration of FIG. 9D.

FIGS. 10A and 10B illustrate two exemplary workflows for the depositionof a masking layer to a dielectric portion of a region and a cappinglayer to an electrically conductive portion of a region.

DETAILED DESCRIPTION OF THE INVENTION

The following terms are intended to have the following general meaningsas they are used herein.

The term “substrate” is used herein to refer to a material having arigid, semi-rigid, or flexible surface. The substrate can also include asubstance or material acted upon by another substance, material, and/orprocess. In one embodiment, the substrate can include supportingmaterial(s) (such as a wafer) upon or within which a component orplurality of components (such as a test structure) is fabricated or towhich a component is attached. In another embodiment, the substrate caninclude the supporting material(s) and the component(s). The substrateincludes for example a plate, wafer, panel and/or disk of suitablematerial on and/or in which the components of a unit, such as anintegrated or printed circuit, are deposited or formed. A flexiblesubstrate can include plastic or polymeric material, for exampleflexible materials used in displays or other flexible IC applications.In many embodiments, at least one surface of the substrate will besubstantially flat, although in some embodiments it may be desirable tophysically separate synthesis regions for different materials with, forexample, dimples, wells, raised regions, etched trenches, or the like.In some embodiments, the substrate itself contains wells, raisedregions, etched trenches, etc. which form all or part of the processingregions.

The term “predefined region” is used herein to refer to a localized areaon a substrate which is, was, or is intended to be used for processingor formation of a selected material and is otherwise referred to hereinin the alternative as “known” region, a “selected” region, or simply a“region.” The predefined region can include one region and/or a seriesof regular or periodic regions pre-formed on the substrate. Thepredefined region may have any convenient shape, e.g., circular,rectangular, elliptical, wedge-shaped, etc. In some embodiments, apredefined region and, therefore, the area upon which each process isperformed or distinct material is synthesized, is smaller than about 25cm², preferably less than 10 cm², more preferably less than 5 cm², evenmore preferably less than 1 cm², still more preferably less than 1 mm²,and even more preferably less than 0.5 mm².

The term “radiation” is used herein to refer to energy which may beselectively applied including energy having a wavelength between 10⁻¹⁴and 10⁴ meters including, for example, electron beam radiation, gammaradiation, x-ray radiation, ultraviolet radiation, visible light,infrared radiation, microwave radiation and radio waves. “Irradiation”refers to the application of radiation to a surface or emission ofenergy directed at a substrate.

As used herein, the term “processing material” is used herein to referto each of the substances that are delivered to a region of a substratefor processing.

The term “process” or “processing” is used herein to refer to a finitecourse of actions, operations, events, and/or changes defined by purposeor effect. “Process” or “processing” is used herein to include, but notbe restricted to, providing a processing material to a region and/ormodifying a region. Processing specifically includes physicalmodifications, chemical modifications, electrical modifications, thermalmodifications, magnetic modifications, photonic modifications, andphotolytic modifications, more specifically cleaning, surfacemodification, surface preparation, deposition, dispensing, reaction,functionalization, etching, planarization, chemical mechanicalplanarization, electrochemical mechanical planarization, lithography,patterning, implantation, irradiation, electromagnetic irradiation,microwave irradiation, radio frequency (RF) irradiation, thermaltreatment, infrared (IR) treatment, ultraviolet (UV) treatment, deepultraviolet (DUV) treatment, extreme ultraviolet (EUV) treatment,electron beam treatment, and x-ray treatment, and more specificallyelectrochemical deposition, electroless deposition, physical vapordeposition, chemical vapor deposition, atomic layer deposition, vaporphase epitaxy, liquid phase epitaxy, chemical beam epitaxy, molecularbeam epitaxy, molecular self-assembly, and evaporation. Processingconditions are those conditions, such as temperature, time, pressure,material phase, amount, component ratio, etc., under which processingoccurs. “Process sequence” is used herein to refer to a series ofprocesses performed in a unique order and/or combination to effect adesired end result, for example, to form or modify structures, teststructures, devices, integrated circuits, etc. “Process sequenceconditions” are those conditions such as temperature, time, pressure,material phase, amount, component ratio, etc., under which a sequence ofprocesses occurs. “Combinatorial process sequence integration” is usedherein to describe i) evaluating different materials, ii) evaluatingdifferent processing conditions, iii) evaluating different sequencingand integration of processes (with respect to both modules within a tooland to a plurality of tools in a process flow), and combinationsthereof, for such used as in the manufacture of devices such asintegrated circuits.

The term “device” is used herein to refer to a unit that is capable ofperforming some specific function. A device can include electrical,biological, and/or mechanical components, such as discrete electroniccomponents. A device can also include components (e.g., transistor,resistor, diode, capacitor, etc.) of a particular type (e.g.,electronic, magnetic, photonic, optoelectronic, magnetoelectronic,magenetooptic, molecular, etc.) on a substrate; which can be active orpassive.

The term “structure” is used herein to refer to an arrangement,organization, and/or placement of one or more parts and/or elements. Thestructure can include topographical features, such as vias, holes,lines, trenches, and test structures, useful for extracting informationabout a process, identifying process problems, and improving a processas well as device performance. Test structures include device teststructures, such as transistors, capacitors and diodes, process teststructures, such as a 4-point probe structures, via chain structures,and continuity and isolation structures, circuit test structures, suchas inverters and ring oscillators, and SEM test structures.

The present invention provides methods and apparatus for thecombinatorial investigation of processing of and process sequenceintegration for regions contained on a single substrate used typicallyin device fabrication. The invention is described herein primarily withregard to processing of ICs, but can readily be applied in theprocessing of other types of devices and the investigation of newmaterials for such uses. Some types of substrates which can be processedin accordance with the methods of the present invention include, forexample, blanket wafers, patterned wafers, and substrates includingdevices, functional chips, functional devices, and test structures. Moreparticularly, substrates which can be processed in accordance with themethods of the present invention include, but are not limited to,semiconductor devices, flat panel displays, optoelectronic devices, datastorage devices, magnetoelectronic devices, magnetooptic devices,molecular electronic devices, solar cells, photonic devices, andpackaged devices, or other devices which will be apparent to those ofskill in the art upon review of this disclosure.

In some embodiments, the regions of the substrate are processed usingwet (i.e., liquid based) processing techniques, which include, forexample, cleaning, surface modification, surface preparation, anddeposition. Exemplary cleaning processes include, but are not limitedto, etching, removal of metallic contamination, removal of organiccontamination, and removal of oxides. Exemplary surface modification andpreparation processes include, but are not limited to, modification of asurface chemical state, modification of surface bonding sites,modification of surface charge, modification of surface environment, andmodification using one or more materials and/or classes of materialsthat suppress, accelerate, and/or catalyze reactions (these materialscan be incorporated into any structure and/or material resulting fromthe reaction of which they are a component but are not so limited).Exemplary deposition processes include, but are not limited to, organiccoating formation via self assembled monolayers (SAMs),polyelectrolytes, layer by layer polyectrolytes, surfactancts,nanoparticles, etc., electrochemical deposition and electrolessdeposition. Similar methodologies can be applied towards dry (e.g.,plasma based, and gas and/or vapor phase) processing techniques, knownto those of skill in the art.

The resulting substrate having an array of processed regions thereonwill have a variety of uses. For example, once prepared, the substratecan be screened for materials having useful properties. Alternatively,the processed regions of the substrate can be screened for structuresand devices having useful properties. Additionally, the substrate can bescreened for processes, process sequences, and/or process sequenceintegrations that are useful for device optimization, development,performance, yield, integration, etc. Furthermore, the substrate onceprepared can be provided to one or more other processes, for examplefollow-on processing of the substrate and/or processes which incorporatethe processed substrate into other components. Accordingly, the array ofprocessed regions is preferably on a single substrate. By processing thearray of regions on a single substrate, screening the array for regionshaving useful properties is more easily carried out and efficient.

Properties which can be screened for include, for example, opticalproperties, chemical composition, chemical reactivity, electricalproperties, physical properties, magnetic properties, thermalproperties, structural properties and mechanical properties. Moreparticularly, properties which can be screened for include, for example,material location, material distribution, material thickness, materialstep coverage, material continuity, parametric testing for yield, viachain yield, line yield, via resistance, line resistance, Kelvinresistance, leakage, and capacitance, device testing for operationalfrequency, switching speed, power dissipation, mobility,transconductance, drive current, threshold voltage, capacitance,resistance, body effect, channel doping, sub-threshold behavior, andcharge density, and reliability testing for stress migration,electromigration, bias thermal stress, thermal stress, mechanicalstress, environmental stress of at least one environmental parameter,and time dependent dielectric breakdown. Other properties includeconductivity, super-conductivity, thermal conductivity, anisotropy,hardness, crystallinity, optical transparency, magnetoresistance,permeability, frequency doubling, photoemission, coercivity, criticalcurrent, or other useful properties which will be apparent to those ofskill in the art upon review of this disclosure. Importantly, theprocessing and screening of a diverse array of process conditionsenables the evaluation of new compositions with new physical properties,new processes, new process conditions, new process sequences, newprocess sequence integrations, etc., for use in such fields as chipmanufacturing. Any process found to improve current materials/processescan be subsequently processed on a large-scale. It will be apparent tothose of skill in the art that once identified using the methods of thepresent invention, a variety of different methods can be used to processsuch useful materials/processing/process sequence integration on a largeor batch scale with essentially the same properties. The methods andsystems described herein thus can be used in processes to effectcombinatorial process sequence integration and as such are not limitedto material/process characterization.

In some embodiments of the present invention, methods are used toanalyze variations in process steps or sequences, such as lithographicsteps, dry etch steps, deposition steps, or CMP. For example, as is wellknown in the art, the CMP process is often used to planarize structuresthat build up during multilevel deposition processes. These structurescan be used as damascene interconnects, conductive plugs, or for otherpurposes. The CMP process is important to copper metallization, sincecopper cannot be easily dry-etched (the etch products beingnon-volatile), but is readily processed using CMP. However, the CMPprocess may polish away functioning circuit parts through dishing(leading to opens) or copper smearing (leading to shorts) when thecircuit layout changes drastically in density, pitch and or in thehorizontal aspect ratio (length:width) or under certain CMP processconditions. The ability of the system of the present invention toinvestigate variations in processes, such as the CMP process, as well asprocesses for processing of the regions prior to CMP, will lead tooptimal process conditions to overcome the aforementioned problems in atimely, more cost-effective manner.

Also, for example, resists for lithography processes are requiringsmaller and smaller sizes. For <100 nm feature size pattern transfer,line edge roughness becomes increasingly important. The methods andsystems of the present invention described herein can be used tooptimize the chemistries and processes and/or sequencing of processesrequired to achieve smooth pattern transfer. The systems and method ofthe present invention also have applications to finding new materialsfor and improving process conditions for materials utilized in chipfabrication processes, such as barrier layers, adhesion layers and seedlayers.

The invention is described in further detail below with reference to thefigures, in which like items are numbered the same in the severalfigures.

Generally, an array of regions is processed by delivering processingmaterials to predefined regions on a substrate and/or modifying thepredefined regions. FIG. 1A is a flowchart illustrating a methodologyfor combinatorial process sequence integration in accordance with oneembodiment of the present invention. The embodiment may utilize aprocessing tool (which may or may not be an integrated tool comprised ofdiscrete unit modules which collectively perform the effective unitprocess) that will perform the desired process for analysis. In oneembodiment, the processing tool can perform the process in a discretizedfashion within unique regions contained in a single monolithicsubstrate, such as a 300 mm diameter wafer used in IC manufacturing. Thesubstrate is provided to the system 100, and is processed in adiscretized, preferably isolated, fashion (either in a serial, parallel,or serial-parallel mode) whereby at least two regions of the substrateare processed differently from each other 110. The substrate processedin the aforementioned combinatorial fashion can optionally also bepreviously 120 and/or subsequently 130 processed in a conventionalfashion with at least one process step, whereby the entire orsubstantially close to the entire substrate sees the same processingconditions. This allows the described combinatorialprocessing/combinatorial process sequence integration approach to beemployed in desired segments of the process flow required to build anend device(s), integrated circuit, etc. The processed regions, such asdevices or portions of devices created, can then be tested 140 for aproperty of interest using conventional methods for analysis, such asparametric testing for properties such as yield, via resistance, lineresistance, capacitance, etc. and/or reliability testing for propertiessuch as stress migration, electromigration, bias thermal stress, timedependent dielectric breakdown, and related testing known to those ofskill in the art. The processed regions can be tested simultaneously,sequentially, or in a parallel-serial mode, where a first plurality ofregions is simultaneously tested, followed by a second plurality ofregions being simultaneously tested. The testing 140 is optionallyperformed in one or more alternative embodiments of the methodology forcombinatorial process sequence integration.

The combinatorial process sequence integration of an embodiment uses aprocessing tool referred to herein as a site-isolated processing toolthat will perform one or more processes. In one embodiment, thesite-isolated processing tool processes a substrate in a discretized,isolated fashion (either in a serial, parallel, or serial-parallel mode)within unique regions of the substrate (e.g., at least two regions ofthe substrate are processed differently from each other). In processingan array of regions, as described herein, processing materials can bedelivered to regions (including predefined regions) on a substrateand/or the regions (including predefined regions) can be modified usingany number of site-isolated processing processes or sequences incombination with any number of conventional processing processes orsequences. For example, a method under the combinatorial processsequence integration herein receives a substrate from at least one firstprocess selected from a group consisting of depositing, patterning,etching, cleaning, planarizing, implanting, and treating. The methodgenerates a processed substrate by processing at least one region of thesubstrate differently from at least one other region of the substrate.The processing includes modifying the at least one region, whereinmodifying includes at least one of physical modifications, chemicalmodifications, electrical modifications, thermal modifications, magneticmodifications, photonic modifications, and photolytic modifications,wherein the processing forms at least one array of differentiallyprocessed regions on the substrate. In one embodiment, theaforementioned processing includes modifying using at least one ofmaterials, processing conditions, process sequences, process sequenceintegration, and process sequence conditions. In one other embodiment,the aforementioned processed substrate is provided to at least oneadditional process selected from a group consisting of depositing,patterning, etching, cleaning, planarizing, implanting, and treating.

As another example, a method under the combinatorial process sequenceintegration herein generates a processed substrate by processing atleast one region of the substrate differently from at least one otherregion of the substrate. The processing includes modifying the at leastone region, wherein modifying includes at least one of physicalmodifications, chemical modifications, electrical modifications, thermalmodifications, magnetic modifications, photonic modifications, andphotolytic modifications, wherein the processing forms at least onearray of differentially processed regions on the substrate. The methodcontinues by providing the processed substrate to at least oneadditional process selected from a group consisting of depositing,patterning, etching, cleaning, planarizing, implanting, and treating. Inone embodiment, the aforementioned processing includes modifying usingat least one of materials, processing conditions, process sequences,process sequence integration, and process sequence conditions.

FIG. 1B is a flowchart illustrating a general methodology 100-B forcombinatorial process sequence integration that includes site-isolatedprocessing and/or conventional processing, under an embodiment. Oneexample of a processing sequence under the embodiments herein is asfollows: process the substrate using Conventional Process N, thenprocess the substrate using Site-Isolated Process N+1, then process thesubstrate using Site-Isolated Process N+2, then process the substrateusing Conventional Process N+3, then perform E-test (e.g. electricaltesting). Another example of a processing sequence under the embodimentsherein is as follows: process the substrate using Site-Isolated ProcessN, then process the substrate using Site-Isolated Process N+1, thenprocess the substrate using Conventional Process N+2, then process thesubstrate using Site-Isolated Process N+3, then perform E-test. Yetanother example of a processing sequence under the embodiments herein isas follows: process the substrate using Site-Isolated Process N, thenprocess the substrate using Conventional Process N+1, then process thesubstrate using Site-Isolated Process N+2, then process the substrateusing Conventional Process N+3, then perform E-test. Various otherprocessing sequences can be effected according to the methodology 100-B.The combinatorial process sequence integration thus generates forexample a semiconductor wafer 200 comprising a die array that includes aplurality of dies 202 that can be test dies and/or actual product diescontaining intended integrated circuitry. Blanket wafers, patternwafers, devices, functional chips, functional devices, test structures,semiconductors, integrated circuits, flat panel displays, optoelectronicdevices, data storage devices, magnetoelectronic devices, magnetoopticdevices, molecular electronic devices, solar cells, photonic devices,and packaged devices can be processed and/or generated using theaforementioned combinatorial process sequence integration methodology.The combinatorial process sequence integration can be applied to anydesired segment(s) and/or portion(s) of an overall process flow.Characterization, including electrical testing, can be performed aftereach process step, and/or series of process steps within the processflow as needed and/or desired.

FIG. 1C is a flowchart illustrating a more specific methodology 100-Cfor combinatorial process sequence integration that includessite-isolated processing and/or conventional processing, under anembodiment. One example of a processing sequence under the embodimentsherein is as follows: process the substrate using ConventionalPre-clean, then process the substrate using Site-Isolated MolecularMask, then process the substrate using Site-Isolated Electroless Cap,then process the substrate using Conventional Strip and Clean, thenperform E-test. Another example of a processing sequence under theembodiments herein is as follows: process the substrate usingSite-Isolated Pre-clean, then process the substrate using Site-IsolatedMolecular Mask, then process the substrate using ConventionalElectroless Cap, then process the substrate using Site-Isolated Stripand Clean, then perform E-test. Yet another example of a processingsequence under the embodiments herein is as follows: process thesubstrate using Site-Isolated Pre-clean, then process the substrateusing Conventional Molecular Mask, then process the substrate usingSite-Isolated Electroless Cap, then process the substrate usingConventional Strip and Clean, then perform E-test. Various otherprocessing sequences can be effected according to the methodology 100-C.

In some methods of the present invention, processing materials aredelivered to predefined regions on the substrate, and can be reactedusing a number of different routes. For example, the processingmaterials can be reacted using, for example, solution based synthesistechniques, photochemical techniques, polymerization techniques,template directed synthesis techniques, epitaxial growth techniques, bythe sol-gel process, by thermal, infrared or microwave heating, bycalcination, sintering or annealing, by hydrothermal methods, by fluxmethods, by crystallization through vaporization of solvent, etc. Otheruseful reaction techniques that can be used to react the processingmaterials of interest will be readily apparent to those of skill in theart.

Since the regions of the substrate are processed independently of eachother, the processing conditions at different regions can be controlledindependently. As such, process material amounts, reactant solvents,processing temperatures, processing times, processing pressures, therates at which the reactions are quenched, deposition order of processmaterials, process sequence steps, etc. can be varied from region toregion on the substrate. Thus, for example, when exploring materials, aprocessing material delivered to a first and a second region can be thesame or different. If the processing material delivered to the firstregion is the same as the processing material delivered to the secondregion, this processing material can be offered to the first and secondregions on the substrate at either the same or different concentrations.This is true as well for additional processing materials delivered tothe first and second regions, etc. As with the processing materialdelivered to the first and second regions, the additional processingmaterials delivered to the first and second regions can be the same ordifferent and, if the same, can be offered to the first and secondregions on the substrate at either the same or different concentrations.Moreover, within a given predefined region on the substrate, theprocessing materials can be delivered in either a uniform or gradientfashion. If the same processing materials are delivered to the first andsecond regions of the substrate at identical concentrations, then theconditions (e.g., reaction temperatures, reaction times, etc.) underwhich the regions are processed can be varied from region to region.Parameters which can be varied include, for example, material amounts,solvents, process temperatures, process times, the pressures at whichthe processes are carried out, the atmospheres in which the processesare conducted, the rates at which the processes are quenched, the orderin which the materials are deposited, etc. Other process parameterswhich can be varied will be apparent to those of skill in the art.

Moreover, in one embodiment of the present invention, a method isprovided for forming at least two different arrays of materials bydelivering substantially the same processing materials at substantiallyidentical concentrations to corresponding regions on both first andsecond substrates having different surfaces, such as a dielectricmaterial surface and an electrically conductive surface, in order torepresent different portions of regions on an IC chip, and, thereafter,subjecting the process materials on the substrates to a first set ofprocess conditions. Using this method, the effects of the processparameters or materials on the various substrate surfaces can be studiedand, in turn, optimized.

Substrate

The methods of the present invention are used to process an array ofregions at known locations, preferably on a single substrate surface.Essentially, any conceivable substrate can be employed in the invention.The substrate can have any convenient shape, such a disc, square,sphere, circle, etc. The substrate is preferably flat, but may take on avariety of alternative surface configurations. For example, thesubstrate may contain raised or depressed regions on which thecombinatorial processes take place. The substrate and its surfacepreferably form a rigid support on which to carry out the processingdescribed herein. The substrate may be any of a wide variety ofmaterials including, for example, polymers, plastics, Pyrex, quartz,resins, silicon, silica or silica-based materials, carbon, metals,inorganic glasses, inorganic crystals, membranes, etc. Other substratematerials will be readily apparent to those of skill in the art uponreview of this disclosure. Surfaces on the solid substrate can becomposed of the same materials as the substrate or, alternatively, theycan be different, i.e., the substrates can be coated with, or contain adifferent material. Moreover, the substrate surface can contain thereonstructures or devices. The most appropriate substrate andsubstrate-surface materials will depend on the processes to be performedand the selection in any given case will be readily apparent to those ofskill in the art.

In some embodiments, a predefined region on the substrate or a portionof the region, and, therefore, the area upon which each process iscarried out is smaller than about 25 cm², specifically less than 10 cm²,more specifically less than 5 cm², even more specifically 1 cm², stillmore specifically less than 1 mm².

The processing materials utilized in the processing of the individualregions must often be prevented from moving to adjacent regions. Mostsimply, this can be ensured by leaving a sufficient amount of spacebetween the regions on the substrate so that the various processingmaterials cannot interdiffuse between regions. Moreover, this can beensured by providing an appropriate barrier between the various regionson the substrate during processing. In one approach, a mechanical deviceor physical structure defines the various regions on the substrate. Awall or other physical barrier, for example, can be used to prevent thematerials in the individual regions from moving to adjacent regions.This wall or physical barrier may be removed after the synthesis iscarried out. One of skill in the art will appreciate that, at times, itmay be beneficial to remove the wall or physical barrier beforescreening the array of materials.

In other embodiments, the processing may be effected without the need ofbarriers which physically touch the substrate. For example, lasers,radiative lamps, UV radiation sources, other “point” sources can be usedto process regions in a site addressable fashion as the area ofmodification is nominally smaller and/or equivalent in size to thediscrete regions of interest on the substrate. In yet anotherembodiment, a physical barrier can be used to essentially screen and/orlimit the processing to a desired region(s) and/or portion(s) of aregion(s) wherein the physical barrier does not physically touch thesubstrate. For example, a physical barrier can be used to essentiallyblock and/or restrict processing to certain region(s) and/or portion(s)or region(s). A screen, such as a mask or shutter, can be used to blockvapor fluxes such as from PVD (i.e. sputtering) or evaporation sourcesfor example. An opaque vs. transparent mask can be used to let certainradiation through the transparent regions to effect processing inspecified regions on the substrate. In yet another embodiment, gasflows, of preferably an inert gas such as argon (Ar), can be used toscreen out gaseous reagents and or limit the concentrations of suchreagents so as to effectively screen out the effects of such reagentsfrom certain regions. In this fashion, specific regions on a substratecan be processed differently without the need for a physical barrier incommunication with the substrate. This approach is particularly amenableto sequential gas phase vacuum based surface kinetic processes such asatomic layer deposition and various forms thereof (e.g. ion, radical,and plasma induced/enhanced).

Some types of substrates which can be processed in accordance with themethods of the present invention include, for example, blanket wafers,patterned wafers, and substrates including devices, functional chips,functional devices, and test structures. More specifically, substrateswhich can be processed in accordance with the methods of the presentinvention include, but are not limited to, semiconductor devices, flatpanel displays, optoelectronic devices, data storage devices,magnetoelectronic devices, magnetooptic devices, molecular electronicdevices, solar cells, photonic devices, and packaged devices, or otherdevices which will be apparent to those of skill in the art upon reviewof this disclosure.

As is discussed more fully below, a myriad of different types of devicesor structures, such as via chains and conductive lines can be locatedand/or processed within the discrete regions or portions thereof. Suchstructures can also include compact test elements such as contact arraysand elements designed to analyze specific process steps, such aschemical mechanical polishing.

Processing of the regions is preferably performed in a discretizedfashion within unique regions contained in a single monolithic substrate200 as shown in FIG. 2A, which, in one embodiment is a 300 mm diameterwafer used in IC manufacturing. The number of unique regions 202 istypically greater than two, and more specifically, the number of regionswill correspond to the number of dies on the wafer.

FIGS. 2A and 2B illustrate a semiconductor wafer 200 comprising a diearray that is used in accordance with the principles of one embodimentof the present invention. As illustrated in FIG. 2A, the substrate 200may be comprised of a plurality of dies 202 that can be test dies and/oractual product dies containing intended integrated circuitry.

The dies 202 may be laid out in an orderly row-column fashion as shownin FIG. 2A. As illustrated in FIG. 2C, which shows three differentexemplary types of dies, each individual die 202 may be square orrectangular in shape, and configured to have a number of portions,namely, a first portion 204 and a second portion 206. In someembodiments of the invention, only a first portion 204 of each region202 is processed.

Additionally, as shown in FIG. 2C, each region 202 of the substrateand/or each portion 204 206 of each region 202 of the substrate 200includes at least two structures or devices, more specifically, at leastfour structures or devices, and more specifically at least sixstructures or devices. In some embodiments, the plurality of structuresin each region 202 or portion 204 206 of each region is the same in eachregion or portion of each region on the substrate 200. The structures ordevices represent structures that may be constructed in various steps ofthe semiconductor manufacturing process. Each of the portions 204 206may comprise one or more groups of structures that are laid out in apredetermined fashion according to their design. Additionally, thestructures located in each region are preferably test and/or productdevice structures.

In some embodiments, a single substrate has at least 4 differentprocessed regions and, more specifically, at least 10 differentprocessed regions, more specifically, at least 50 different processedregions, and more specifically, at least 100 different processedregions. The density of regions per unit area will be greater than 0.01regions/cm², more specifically greater than 0.05 regions/cm², even morespecifically greater than 0.1 region/cm², and even more specificallygreater than 0.5 regions/cm², and still more specifically greater than 1regions/cm².

As previously explained, the substrate is preferably flat, but may takeon a variety of alternative surface configurations. Regardless of theconfiguration of the substrate surface, it is desirable that theprocessing of each individual region, or portion thereof be preventedfrom affecting adjacent regions or portions thereof to be processed.Most simply, this can be ensured by leaving a sufficient amount of spacebetween the regions on the substrate so that the various materialscannot interdiffuse between regions. Moreover, this can be ensured byisolating regions from one another by providing an appropriate barrierbetween the various regions on the substrate. A mechanical device orphysical structure, which may or may not contact the substrate, can beused to define the various regions on the substrate. For example, a wallor other physical barrier, which, in some embodiments, can be removedafter processing, can be used to prevent the material in the individualregions from moving to adjacent regions.

Methods For Delivery Of Processing Materials

In some embodiments of the present invention, processing materials aredelivered into each region. This may be accomplished using a variety ofdelivery techniques. Delivery techniques which are suitable for use inthe methods of the present invention can include, for example, the useof thin-film deposition techniques and those involving the use of adispenser

Thin-film deposition techniques in combination with isolation orphotolithographic techniques can be used to deposit thin-films onpredefined regions on the substrate. Such thin-film depositiontechniques can generally be broken down into the following fourcategories: evaporative methods, glow-discharge processes, gas-phasechemical processes, and liquid-phase chemical techniques. Includedwithin these categories are, for example, sputtering techniques,spraying techniques, laser ablation techniques, electron beam or thermalevaporation techniques, ion implantation or doping techniques, chemicalvapor deposition techniques, as well as other techniques used in thefabrication of integrated circuits. All of these techniques can beapplied to deposit highly uniform layers, i.e., thin-films, of variousmaterials on selected regions on the substrate. For an overview of thevarious thin-film deposition techniques which can be used in the methodsof the present invention, see, for example, Handbook of Thin-FilmDeposition Processes and Techniques, Noyes Publication (1988), which isincorporated herein by reference for all purposes.

Thin-films of various materials can be deposited on the substrate usingevaporative methods, such as Molecular Beam Epitaxy in combination withphysical masking techniques, such as those disclosed in U.S. Pat. No.5,985,356, the disclosure of which is hereby incorporated by referencein its entirety for all purposes. Generally, in thermal evaporation orvacuum evaporation methods, the following sequential steps take place:(1) a vapor is generated by boiling or subliming a target material; (2)the vapor is transported from the source to the substrate; and (3) thevapor is condensed to a solid film on the substrate surface. Evaporants,i.e., target materials, which can be used in evaporative methods coveran extraordinary range of varying chemical reactivity and vaporpressures and, thus, a wide variety of sources can be used to vaporizethe target material. Such sources include, for example,resistance-heated filaments, electron beams; crucible heated byconduction, radiation or rf-inductions; arcs, exploding wires andlasers. In some embodiments of the present invention, thin-filmdeposition using evaporative methods is carried out using lasers,filaments, electron beams or ion beams as the source. Successive roundsof deposition, through different physical masks, using evaporativemethods generates an array of differentially processed regions on asubstrate.

In addition to evaporative methods, thin-films of various materials canbe deposited on the substrate using glow-discharge processes andsystems, such as sputtering, or sputter deposition processes, includingRF/DC Glow Discharge Plasma Sputtering, Ion-Beam Sputtering, diodesputtering, and reactive sputtering in combination with physical maskingtechniques. Successive rounds of deposition, through different physicalmasks, using sputtering or other glow-discharge techniques and systems,such as those disclosed in U.S. Pat. No. 5,985,356 generate an array ofdifferentially processed regions on a substrate.

In addition to evaporative methods and sputtering techniques, thin-filmsof the various reactants can be deposited on the substrate usingChemical Vapor Deposition techniques in combination with physicalmasking techniques and systems as disclosed in U.S. Pat. No. 5,985,356.

In addition to evaporative methods, sputtering and Chemical VaporDeposition, thin-films of the various reactants can be deposited on thesubstrate using a number of different mechanical techniques incombination with physical masking or isolation techniques. Suchmechanical techniques include, for example, spraying, spinning, dipping,and draining, flow coating, roller coating, pressure-curtain coating,brushing, etc. Sprayers which can be used to deposit thin-films include,for example, ultrasonic nozzle sprayers, air atomizing nozzle sprayersand atomizing nozzle sprayers. In ultrasonic sprayers, disc-shapedceramic piezoelectric transducers covert electrical energy intomechanical energy. The transducers receive electrical input in the formof a high-frequency signal from a power supply that acts as acombination oscillator/amplifier. In air atomizing sprayers, the nozzlesintermix air and liquid streams to produce a completely atomized spray.In atomizing sprayers, the nozzles use the energy of a pressurizedliquid to atomize the liquid and, in turn, produce a spray. Depositionthrough different physical masking and isolation techniques, usingmechanical techniques such as spraying generates an array ofdifferentially processed regions on the substrate.

In addition to the thin film-techniques described above, dispensers canbe utilized to deliver processing materials in the form of droplets orpowder to a single substrate.

In some embodiments, the present invention may employ dispenserscommonly utilized in the ink-jet printing field. Such ink-jet dispensersinclude, for example, the pulse pressure type, the bubble jet type andthe slit jet type.

Such ink-jet printers can be used with minor modification by simplysubstituting a solution or powder for the ink. For example, Wong, etal., European Patent Application 260 965, incorporated herein byreference for all purposes, describes the use of a pulse pressure typeink-jet printer to apply an antibody to a solid matrix.

One embodiment of an ink drop dispenser of the pulse pressure type whichmay be employed in the present invention is described in U.S. Pat. No.5,985,356. It will be readily apparent to those of skill in the art thatink-jet printers of the bubble jet type and the slit jet type can alsobe used, with only minor modifications, to deliver materials topredefined regions on the substrate. Moreover, it will be readilyapparent to those of skill in the art that ink-jet printers havingmultiple nozzles can be used to deliver multiple materials to predefinedregions on the substrate. In addition, as improvements are made in fieldof ink-jet printers, such improvements can be used in the methods of thepresent invention.

Using the aforementioned techniques, the processing materials can bedelivered to predefined regions on the substrate either sequentially orsimultaneously. In one embodiment, the processing materials aresimultaneously delivered to either a single predefined region on thesubstrate or, alternatively, to multiple predefined regions on thesubstrate. For example, using a dispenser such as an ink-jet dispenserhaving two nozzles, two different processing materials can besimultaneously delivered to a single predefined region on the substrate.Alternatively, using this same ink-jet dispenser, a processing materialcan be simultaneously delivered to two different predefined regions onthe substrate. In this instance, the same processing material or,alternatively, two different processing materials can be delivered. Ifthe same processing material is delivered to both of the predefinedregions, it can be delivered at either the same or differentconcentrations. Similarly, using a dispenser such as an ink-jetdispenser having eight nozzles, for example, eight different processingmaterials can be simultaneously delivered to a single predefined regionon the substrate or, alternatively, eight processing materials (eitherthe same or different) can be simultaneously delivered to eightdifferent predefined regions on the substrate.

It will be readily apparent to those of skill in the art that theforegoing delivery techniques are intended to illustrate, and notrestrict, the ways in which the processing materials can be delivered tothe substrate. Other delivery techniques, such as stamping, rolling, orotherwise imprinting known to and used by those of skill in the art canalso be used.

Processing Tool

Processing systems of the invention include a processing tool adapted toprocess each region of the substrate individually. In one embodiment ofthe present invention, the processing tool is adapted for the deliveryof processing materials to the regions of the substrate, and is carriedout using a partially or fully automated solution delivery systemincluding a processing cell and its associated solution delivery system,robotics and electronics.

FIG. 3A illustrates an embodiment of a system of the present inventionfor combinatorial process sequence integration of wet processes, such asthose used in IC and related manufacturing, in which a processing cellfor carrying out a processing step or process sequence can be discretelystepped across desired locations of a substrate, such as a wafer,preferably per die location by translating the substrate. The cell ismade so as to fully encompass each region, e.g., die, or a first portionof each die, but not interfere with neighboring regions, e.g., dies orportions of dies.

FIG. 3A shows one embodiment of a processing system for processingregions of a substrate. In the system, a processing cell 300 correspondsto a first region, such as an individual die location on a singlemonolithic substrate 302, such as a 300 mm wafer. The processing cell300, which is held by a frame 301 (shown in FIG. 3B) and optionallyhangs from a spring 307, can be used to process a unique region on thesubstrate 302 in a unique fashion compared to other regions on thesubstrate 302. The processing cell 300 can also be used to perform aunique sequence of unit processes. In one embodiment, the substrate 302is located on a stage 304, such as an X-Y-Z translatable stage, whichcan hold the substrate 302. Positioning and alignment techniques can beused to align and position the substrate 302, such that the processingcell 300 is aligned and brought into contact with a correspondingregion, such as a die on the substrate 302. This can be achieved usingalignment pins in conjunction with stepper motors, or optical alignment,and/or other commonly known techniques to move the substrate 302 withrespect to the processing cell 300. A sealing element 306 such as anelastomeric seal, e.g., o-ring, can be used to form a seal between theprocessing cell 300 and the substrate 302 when the two elements arebrought into contact, to isolate the region of the substrate from otherregions of the substrate. The elastomeric seal may be constructed of amaterial such as Kalrez, Viton or Chemrez, which is chosen to bechemically inert and/or stable with respect to the processingenvironment. The seal is designed such that when in contact with thesubstrate, the region to be processed will be isolated from otherregions to be processed. In this particular example, the stage 304 ismotorized so as to be able to move the substrate 302 in an X-Y directionto align a region of interest with the processing cell 300 andvertically until such sealing can be achieved. Dispensing, placing,processing, etc. within the processing cell 300 can be achieved in aserial fashion with a delivery system 308 which delivers processingfluids 314 through the processing cell 300. The processing cell 300optionally includes a vacuum line 316 for removing residual processingfluids and rinse solvents from the region of the substrate 302subsequent to processing, a rinse line 318, in fluid communication witha rinse solvent source (not shown) for rinsing the processed region ofthe substrate 302, and/or a gas purge line 317 (shown in FIG. 4B) influid communication with a purge gas source (such as argon or nitrogen,not shown) for introducing a gas to the region of the substrate 302before, during, and/or after processing. The gas purge line 317 can bedesigned to introduce gas into the processing cell through theprocessing fluid (by having a length such that an outlet of the line isimmersed in the processing fluid) or to introduce the gas to theatmosphere of the processing cell (by having a length such that anoutlet of the line is not in the processing fluid). The vacuum line 316and rinse line 318 are designed to remove and deliver fluids through theprocessing cell 300 to the isolated region of the substrate. In order tomaintain a clean room-type environment, the processing cell 300 andsubstrate 302 are preferably located in a mini-environment 320 which maybe optionally sealed and/or purged. In some embodiments, themini-environment 320 is purged with a purge gas such as argon ornitrogen. In another embodiment, it is desirable to control the level ofoxygen in the mini-environment to prevent oxidation of the substrateand/or reagents used during the processing of the substrate, and thelike. Nitrogen, argon, helium, forming gas, and other suitable purgegases can be used to maintain low oxygen concentrations within themini-environment 320. The environment 321 outside of themini-environment 320 can be similarly controlled.

The processing cell 300 can also have a heating element 322 embeddedeither in the wall of the cell 300(not shown) or around the outside ofthe cell 300, in order to enable heating of the processing fluids and/orthe substrate 302. In another embodiment, the stage 304 can be heated toheat the substrate 302.

An agitation mechanism 319 (shown in FIG. 4B) can also be present in theprocessing cell 300 to facilitate reactions. For example, a physicalstir rod, a magnetically based agitation, a gas based agitation, avibration based agitation (e.g., sonication), and the like can be usedto locally agitate the processing region of interest. In addition, thesubstrate can be globally agitated via the stage 304 in a rotational,vibrational, and the like fashion(s).

FIG. 3B shows a perspective view of the processing tool described inFIG. 3A without the substrate 302 or delivery system 308.

In one embodiment, the processing cell 300, as shown in FIG. 4A, canhave a tubular configuration having an inner diameter consummate withthe size of the region or portion of the region of the substrate 302that is to be isolated. In one embodiment, the inner diameter of theprocessing cell 300 is between 5-50 mm, more specifically between 10-30mm, and more specifically between 10-20 mm. One of skill in the art willrecognize that the shape is not critical, and that a variety ofconfigurations are within the scope of the invention. The material usedfor the fabrication of the processing cell 300 is preferably chosen tobe chemically inert and stable with respect to process chemistries andenvironments, such as Teflon or quartz. The processing cell can alsooptionally include an insert (not shown). The insert can be designed tobe disposable and optionally can be adapted to be used for specifictypes of processing.

As shown in FIG. 4B, when the processing cell 300 is in contact with thesubstrate 302, processing fluids 314 are delivered to the isolatedregion of the substrate 302 through a probe 310 of the delivery system.In one embodiment, the processing cell is sealed on its upper surface,such as with a septum 311. When delivering processing fluids to theprocessing cell 300, the probe 310 pierces the septum 311. The sealingelement 306 prevents the processing fluids 314 from leaving the isolatedregion. In one embodiment, the processing system is designed for theprocessing cell 300 to hold between 10 μL and 10,000 μL, morespecifically between 100 μL and 5,000 μL, and more specifically between500 μL and 2,000 μL.

In another embodiment, as shown in FIG. 5, the substrate 302 is notlocated on a translation stage, and instead, the processing cell 300includes a support arm 522, a translation station (not shown) forproviding three-dimensional motion of the processing cell 300, and amicroprocessor (not shown), such as a computer, for controllingthree-dimensional motion of the processing cell 300 between variousspatial addresses. In one embodiment, the support arm 522 is preferablyan XYZ robotic arm, such as can be commercially obtained from CavroScientific Instruments, Inc. (Sunnyvale, Calif.) among others. In thisembodiment, the processing cell 300 is translated from region to regionof the substrate 302.

The delivery system 308, as shown in FIGS. 3A, 5, 7C and 7E, such as anauto-delivery system and delivery methods, such as auto-deliveringmethods can be used to deliver processing materials, such as processingfluids to the isolated regions of the substrate 302 for processing theregion. In one embodiment, an auto-delivering system 308 can include amovable probe (tip) 310, typically mounted on a support arm 312, atranslation station (not shown) for providing three-dimensional motionof the probe 310, and a microprocessor (not shown), such as a computer,for controlling three-dimensional motion of the probe 310 betweenvarious spatial addresses. The auto-delivery system 308 preferably alsocomprises a user-interface (not shown) to allow for user programming ofthe microprocessor with respect to probe motion and manipulations. Theprobe 310 can have an interior surface defining a cavity and an inletport for fluid communication between the cavity and a processing fluidsource 314. In one embodiment, the probe is heated using a resistivetemperature-control element or a fluid heat-exchanger typetemperature-control element such as those disclosed in U.S. Pat. No.6,260,407, the disclosure of which is hereby incorporated by referencein its entirety. The probe 310 is also adapted for fluid communicationwith the processing cell 300. The support arm 312 is preferably an XYZrobotic arm, such as can be commercially obtained from Cavro ScientificInstruments, Inc. (Sunnyvale, Calif.) among others. To improvesmoothness of operation at high speeds, such XYZ robotic arms preferablyhave motions based on gradient variations rather than step-functionvariations, and preferably are belt-driven rather than shaft driven. Theauto-delivery system 308 can further include one or more pumps (notshown), preferably syringe pumps, for drawing and/or expelling fluids,such as liquids, and related connection lines (not shown) for fluidcommunication between the pumps, the probe 310, and liquid (e.g.solvent) reservoirs 315. Pump configurations, such as peristaltic pumps,vacuum-pumps or other motive-force providing means can be usedadditionally or alternatively.

In operation, the microprocessor of the auto-delivery system 308 can beprogrammed to direct the auto-delivery system 308 to withdraw aprocessing fluid 314 (e.g., a reactant) from a fluid container 315(e.g., a sample well) formed in a sample tray into the delivery probe310, and subsequently to direct the probe 310 to the processing cell 300for delivering the fluid to the isolated region of the substrate 302through the processing cell 300. The microprocessor of the auto-deliverysystem includes a user-interface that can be programmed in order tovariate the processing conditions among the plurality of regions of thesubstrate 302.

In some embodiments, after delivery of processing material(s) to a firstregion of a substrate, a residual portion of the fluid still remainingin the cavity of the auto-delivery probe 310, if any, can be expelled,for example to a waste container. Additionally or alternatively, theauto-delivery probe can be cleaned during this interval. Cleaning theauto-delivery probe, in an automated fashion, can include flushing thecavity of the probe 310 with a solvent source available to the probe,and then expelling the solvent into a waste container. Such withdrawaland expelling of a cleaning solvent can be repeated one or more times,as necessary to effectively limit the extent of cross-contaminationbetween processing a first and a second region to a level that isacceptable. As an alternative or additional cleaning protocol, the probemay be immersed in a cleaning solution and moved around therein toeffectively rinse residual material from both the external portion ofthe probe and the cavity thereof. The expelling step and the one or morecleaning steps can be, and are preferably automated. While expelling andcleaning steps are generally preferred, no cleaning may be required forprocessing applications in which minor sample cross-contamination isacceptable.

Referring to FIGS. 6A-C, the operation of the automated processingsystem is described as follows. After bringing the processing cell 300into contact with the substrate 302 to isolate a region or a portion ofa region 600 of the substrate 302 from other regions of the substrate602, the delivery system is positioned above the processing cell 300,and the pumps are activated causing the processing fluids located in thecavity of the probe 310 to flow through the processing cell 300 andcollect in a region 600 of the substrate 302 isolated by the processingcell 300 under processing conditions. After processing, residual fluidslocated in the processing cell 300 are removed via the vacuum line 316,the region is optionally rinsed via the rinse line 318, and the deliverysystem 308 is optionally rinsed and moved to the next region 602 (asshown in FIG. 6B) where the next specified processing occurs. In oneembodiment of the present invention, a plurality of process fluids aredelivered and/or a plurality of process sequences are carried out in thefirst region 600 prior to the processing cell 300 moving to the nextregion 602. In one embodiment, a purge gas is used in conjunction withand/or after rinsing. For example, a cleaning or rinsing fluid, such asisopropyl alcohol can be used in conjunction with nitrogen purge gas toeffect a cleaning and/or rinse/dry sequence (e.g., to eliminate orcontrol watermark formation) either in between or after the delivery ofcertain process fluids to a region. The purge gas distribution tube 317can be added to the processing cell so as to effect localizeddistribution of the purge gas to the region of interest. In oneembodiment, all regions, or a portion of all regions of the substrateare individually processed such that the regions are processeddifferently from each other, as shown in FIG. 6C.

FIGS. 7A, 7B, 7C, 7D and 7E illustrate some embodiments of the presentinvention for processing regions in parallel, such as combinatorialprocess sequence integration of wet processes used in IC and relatedmanufacturing. FIG. 7A shows a bottom view of collection of processingcells in a unitary structure 700, preferably corresponding to theindividual die locations or portions of individual die locations withina single monolithic substrate, such as a 300 mm wafer. The cross-sectionshape of the cells is not critical. For example, as shown in FIG. 7A,the processing cells can have a square design. In other embodiments theprocessing cells of the structure 700 can have a circular cross-section.

In some embodiments, the structure 700 is designed to receive a sealingelement for creating a seal between the structure 700 and the substrateduring processing. In one embodiment, the structure 700 includes agroove 701 for receiving a single seal 706, such as that shown in FIG.8, that is adapted to provide a sealing element around each processingcell of the structure 700. In another embodiment, the structure canutilize several seals for groups or individual cells of the structure.

As discussed above for the embodiments utilizing single processingcells, the structure 700 can also include inserts for each processingcell. The inserts can be designed to be disposable and optionally can beadapted to be used for specific types of processing. In this manner,different processes can be conducted on different regions by usingdifferent inserts in different cells of the structure.

Each cell of the structure 700 can be used to process a unique region902 on the substrate 302 in a unique fashion as shown in FIG. 9A. Eachunique site isolated cell can also be used to perform a unique sequenceof unit processes. FIG. 7B shows an embodiment of the multiprocessingcell array 700 mated to a stage 704 which can hold the monolithicsubstrate 702. Positioning and alignment techniques can be used to alignand position the cell array 700 such that the array is aligned to eachcorresponding die on the substrate 302. This can be achieved usingalignment pins in conjunction with stepper motors, or optical alignment,and/or other commonly known techniques to move the substrate withrespect to the multi-processing cell array.

A sealing element 706 such as individual elastomeric seals, e.g.o-rings, corresponding to each unique cell, or a preformed monolithicelastomeric seal can be used to form a seal when the processing cellarray 700 is brought into contact with the substrate 302. Theelastomeric seal 706 is preferably constructed of a material such asKalrez, Viton or Chemrez, which is chosen to be chemically inert and/orstable with respect to the processing environment. The sealing element706 is made to fit into the multiprocessing array 700 (such as in thegroove 701) and is designed such that when in contact with the substrate302, each discrete region of the substrate 302 will be isolated fromother regions or portions thereof. In this particular example, the stageis motorized so as to be able to move the substrate 302 vertically untilsuch sealing can be achieved. Dispensing, placing, processing, etc.within each cell can be achieved using a serial dispenser 308 such asthat described above for the embodiment of FIG. 3A or in a parallelfashion with a plurality of such dispensers 708 as shown in FIG. 7D.

In one embodiment, a parallel dispense is preferable when the relativetiming between the processing of the individual regions becomeimportant. In one embodiment, this is accomplished with a plurality ofdispensers 708 as shown in FIG. 7D. In another embodiment, this isaccomplished by providing a plurality of dispensing cells 716. Thedispensing cells 716 can be separate units or part of a singlestructure, such as a block. The dispensing cells 716 are located abovethe processing cells 700 and provide a location for processing fluids tobe delivered and/or mixed prior and/or otherwise treated prior todelivery to the processing cells 700. In some embodiments, processingfluids are delivered to the dispensing cells 716 until every dispensingcell contains the fluids to be delivered. A valve array 718 can then beopened so that processing fluids are delivered simultaneously to allregions to be processed. Heating elements (not shown) can optionally beembedded in the walls of the dispensing cells 716, or the processingcell to enable global heating of the processing fluids 314 and/or thesubstrate. The substrate itself can also be heated either directly (suchas in an oven or from other external heat sources, such as a laser or UVlamp) or via a heated stage (such as through the use of a resistive andor other suitable heating mechanism). The material used for thefabrication of the multiprocessing cell array is preferably chosen to bechemically inert and stable with respect to process chemistries andenvironments.

The embodiment of FIGS. 7C, 7D and 7E can also optionally include vacuumand rinse lines (not shown) as described in the embodiment of FIG. 3A orthe embodiment of FIG. 4B for removing residual processing fluids andrinse solvents and delivering rinse solvents to the processed regions.In one embodiment, a vacuum and rinse line is located in each processingcell of the structure 700. In another embodiment, a vacuum line andrinse line are translated from cell to cell during processing such as bya Cavro robot. The processing cell can also optionally include anagitation mechanism for use in facilitating reactions. For example, aphysical stir rod, a magnetically based agitation, a gas-basedagitation, a vibration-based agitation, and the like can be used tolocally agitate the processing region of interest. In addition, thesubstrate can be globally agitated via the stage in a rotational,vibrational, and the like fashion(s). The processing system of FIGS. 7C,7D and 7E can also be contained in a mini-environment 712, such as asealed environmental chamber. In other embodiments, each individualprocessing cell can be sealed from the outside environment 713 throughthe use of sealing elements, such as a septum 714 located as eitherseparate elements or as a single unitary structure. The individualprocessing cells can also be independently or individually purged with apurge gas such as argon or nitrogen. In some embodiments, themini-environment 712 is purged with a purge gas such as argon ornitrogen. In another embodiment, it is desirable to control the level ofoxygen in the mini-environment to prevent oxidation of the substrateand/or reagents used during the processing of the substrate, and thelike. Nitrogen, argon, helium, forming gas, and other suitable purgegases can be used to maintain low oxygen concentrations within themini-environment 712. The environment 713 outside of themini-environment 712 can be similarly controlled. In yet anotherembodiment, it is desirable to control the level of oxygen in theenvironment to prevent oxidation of the substrate and/or reagents usedduring the processing of the substrate, and the like. Nitrogen, argon,helium, forming gas, and other suitable purge gases can be used tomaintain low oxygen concentrations within the mini-environment 712. Theoutside environment 713 can be similarly controlled. The pressure withinthe mini-environment 712 and/or the outside environment 713 can be alsoadjusted to be below, at, or above atmospheric pressure.

One of skill in the art will recognize that several variations of theembodiments described above are within the scope of the invention. Forexample embodiments in which a plurality of individual, separateprocessing cells are used to process a plurality of regions or portionsof regions of a substrate are within the scope of the invention.Additionally, embodiments in which a single, unitary structure whichincludes a plurality of processing cells that corresponds to a pluralityof regions of the substrate, but not all of the regions, such that afirst plurality of regions are processed, the processing cell structureand the substrate are realigned, and a second plurality of regions isprocessed are also within the scope of the invention. Furthermore, inother embodiments, such as those shown in FIGS. 9B and 9D, theprocessing cells have a circular shape, and can be configured such thatan entire region 202 is covered by the processing cells, but not all ofthe regions are processed. In FIG. 9B, the parallel processingstructure, which may be a plurality of separate cells, or a plurality ofcells in a single structure, is configured such that every other region903 is processed with the edge of the processing cells contacting onlythe comers of the regions to be processed. FIG. 9C illustrates thesubstrate 302 with every other region 903 processed with theconfiguration of FIG. 9B. In FIG. 9D, the parallel processing structureis configured such that only certain regions 903 are processed with theedge of the processing cells contacting no portion of the regions to beprocessed. FIG. 9E illustrates the substrate 302 with certain regions903 processed with the configuration of FIG. 9D.

In addition to the foregoing isolation techniques, photolithographictechniques of the type known in the semiconductor industry can be usedto isolate regions of a substrate. For an overview of such techniques,see, for example, Sze, VLSI Technology, McGraw-Hill (1983) and Mead, etal., Introduction to VLSI Systems, Addison-Wesley (1980), which areincorporated herein by reference for all purposes. A number of differentphotolithographic techniques known to those of skill in the art can beused. In one embodiment, for example, a photoresist is deposited on thesubstrate surface; the photoresist is selectively exposed, i.e.,photolyzed; the photolyzed or exposed photoresist is removed; aprocessing material is deposited on the exposed regions on thesubstrate; and the remaining unphotolyzed photoresist is removed.

Alternatively, when a negative photoresist is used, the photoresist isdeposited on the substrate surface; the photoresist is selectivelyexposed, i.e., photolyzed; the unphotolyzed photoresist is removed; aprocessing material is deposited on the exposed regions on thesubstrate; and the remaining photoresist is removed. In anotherembodiment, a processing material is deposited on the substrate using,for example, spin-on or spin-coating techniques; a photoresist isdeposited on top of the processing material; the photoresist isselectively exposed, i.e., photolyzed; the photoresist is removed fromthe exposed regions; the exposed regions are etched to remove theprocessing material from those regions; and the remaining unphotolyzedphotoresist is removed. As with the previous embodiment, a negativephotoresist can be used in place of the positive photoresist. Suchphotolithographic techniques can be repeated to produce an array ofprocessing material on the substrate for parallel processing.

It will be readily apparent to those of skill in the art that theforegoing deposition techniques are intended to illustrate, and notrestrict, the ways in which the processing materials can be delivered tothe substrate. Other delivery techniques known to and used by those ofskill in the art can also be used.

In some embodiments, once the array of processing materials have beendelivered to predefined regions on the substrate, they can be optionallyreacted, either sequentially or simultaneously using a number ofdifferent synthetic routes. The processing materials can be reactedusing, for example, solution based synthesis techniques, photochemicaltechniques, polymerization techniques, template directed synthesistechniques, epitaxial growth techniques, by the sol-gel process, bythermal, infrared or microwave heating, by calcination, sintering orannealing, by hydrothermal methods, by flux methods, by crystallizationthrough vaporization of solvent, etc. Other useful reaction techniqueswill be apparent to those of skill in the art upon review of thisdisclosure. Moreover, the most appropriate route will depend on theprocessing steps being carried out, and the selection in any given casewill be readily apparent to those of skill in the art. In addition, itwill be readily apparent to those of skill in the art that, ifnecessary, the processing materials can be mixed using, for example,ultrasonic techniques, mechanical techniques, etc. Such techniques canbe applied directly to a given predefined region on the substrate or,alternatively, to all of the predefined regions on the substrate in asimultaneous fashion (e.g., the substrate can be mechanically moved in amanner such that the materials are effectively mixed).

Solid state reactions at lower temperatures, such as those disclosed inU.S. Pat. No. 5,985,356, in which materials are deposited on thesubstrate in the form of very thin-films or, alternatively, by usingsolution based synthesis techniques wherein the reactants are deliveredto the substrate in the form of a solution can also be used.

Furthermore, the array of process materials can be processed between thevarious delivery steps. For example, material A can be delivered to afirst region on a substrate and, thereafter, exposed to oxygen atelevated temperature, for example. Subsequently, material B can bedelivered to the first region on the substrate and, thereafter, reactedunder a set of reaction conditions. Other manipulations and processingsteps which can be carried out between the various delivery steps willbe apparent to those of skill in the art upon reading this disclosure.

It will be readily apparent to those of skill in the art that theforegoing routes are intended to illustrate, and not restrict, the waysin which the processing material can be processed to form at least twodifferentially processed regions on a single substrate. Other routes andother modifications known to and used by those of skill in the art canalso be used.

Methods For Screening the Array of Materials

Once processed, the regions of the substrate can be screened eithersequentially or simultaneously for properties of interest. Either theentire array or, alternatively, a section thereof (e.g., a row ofpredefined regions) can be screened in parallel for properties ofinterest.

Accordingly, in one embodiment, the array of regions on a singlesubstrate is processed such that at least two regions are processeddifferently from each other, and preferably all of the regions of thesubstrate are processed differently from each other. By processing thearray of regions on a single substrate, screening the array of regionsfor a property of interest is more easily carried out. Properties whichcan be screened for include, for example, electrical, thermalmechanical, morphological, optical, magnetic, chemical composition,chemical reactivity, physical properties, magnetic properties,mechanical properties, etc.

The properties of the regions of the substrate can be screened for usingconventional methods and devices known to and used by those of skill inthe art. In one embodiment, screening includes determining a property ofthe processed regions for structural properties such as materiallocation, material distribution, material thickness, material stepcoverage, material continuity, and mechanical properties, such asporosity. In another embodiment, the screening includes parametrictesting of the processed regions that includes testing for propertiessuch as yield, via chain yield, line yield, via resistance, lineresistance, Kelvin resistance, leakage, and capacitance. In anotherembodiment, the screening includes device testing of the processedregions, for properties such as operational frequency, switching speed,power dissipation, mobility, transconductance, drive current, thresholdvoltage, capacitance, resistance, and charge density. In anotherembodiment, the screening includes reliability testing of the processedregions for a property such as stress migration, electromigration, biasthermal stress, thermal stress, mechanical stress, environmental stressof at least one environmental parameter such as heat, humidity, lightand atmosphere, and time dependent dielectric breakdown.

The arrays of the processed regions of the present invention can bescreened sequentially or, alternatively, they can be screened inparallel using various analytical techniques, such as atomic forcemicroscopy, X-ray fluorescence, total reflection X-ray fluorescence,X-ray reflectivity, diffraction, electron diffraction, X-raydiffraction, X-ray photoelectron spectroscopy, auger electronspectroscopy, optical microscopy, scanning electron microscopy,FTIR/RAMAN spectroscopy, ellipsometry, reflectometry, contact angle,adhesion testing (e.g., stud pull test, MELT, and 4-point bend test),sheet resistance, acoustical spectroscopy, ultrasonic spectroscopy,streaming potential, angle-resolved X-ray photoelectron spectroscopy,atomic emission spectroscopy, and UV photoelectron spectroscopy. Inaddition to the foregoing analysis techniques, techniques of the typeknown in the semiconductor industry can be used, such as parametrictesting, reliability testing or other techniques.

It will be readily apparent to those of skill in the art that theforegoing detection systems are intended to illustrate, and notrestrict, the ways in which the array of differentially processedregions can be screened for useful properties. Other detection systemsknown to and used by those of skill in the art can similarly be used.

EXAMPLE

The following examples are provided to illustrate the efficacy of theinventions herein.

Electroless Deposition of Cobalt Alloy Copper Capping Layers

This example illustrates a combinatorial processing approach todiscovering new materials, processes and/or process sequence integrationschemes to address electromigration issues by facilitating formation ofa cobalt capping layer on electrically conductive portions of a regionseparated by a dielectric portion, as described in co-pending U.S.patent application Ser. No. 11/132,841, entitled “Formation Of A MaskingLayer On A Dielectric Region To Facilitate Formation Of A Capping LayerOn Electrically Conductive Regions Separated By The Dielectric Region”,filed on May 18, 2005, U.S. patent application Ser. No. 11/132,817,entitled “Formation Of A Masking Layer On A Dielectric Region ToFacilitate Formation Of A Capping Layer On Electrically ConductiveRegions Separated By The Dielectric Region”, filed on May 18, 2005, andU.S. patent application Ser. No. 11/231,047, entitled “SubstrateProcessing Using Molecular Self-Assembly”, filed on Sep. 19, 2005, thecontents of which are herein incorporated by reference in theirentirety. The site-isolated multiprocessing methods and systemsdescribed in the present invention can be used to examine variations inone or more of the unit process steps listed below, sequencing of theprocesses, and combinations thereof, such that two or more regions of asubstrate effectively receive a different process or sequence ofprocesses, or processing history.

FIG. 10A shows an exemplary workflow of one embodiment for the approach.A region of a substrate includes at least a dielectric portion (such asSiO₂, SiCOH, SiOC, SiCO, SiC, SiCN, etc.) 1000 and an electricallyconductive portion (such as copper or copper oxide) 1002. Aftercleaning, a masking layer 1004 is formed at least on the dielectricportion 1000 of the region. In one embodiment, the region is processedin such a way that the masking layer 1004 forms on all portions of theregion (shown by step 1006), but is easily removable from theelectrically conductive portions 1002 of the region (shown by step 1008)resulting in a masking layer 1004 on only the dielectric portion 1000 ofthe region. In another embodiment, the region is processed so that themasking layer 1004 is selective only to the dielectric portion 1000 ofthe region and forms a layer only on the dielectric portion 1000 of theregion (as shown by step 1010). An electroless cobalt (Co) alloydeposition process 1012 then deposits a capping layer (such as CoW,CoWP, CoWB, CoB, CoBP, CoWBP, Co containing alloys, etc.) 1014 on theelectrically conductive portions 1002 of the region wherein the maskinglayer 1004 inhibits capping layer 1014 formation over the dielectricportion 1000 of the region. In one embodiment, after formation of themasking layer 1004, a dielectric barrier layer 1018 (such as, siliconnitride, silicon carbide, silicon carbon nitride, etc.) is subsequentlyformed on top of the capping layer 1014 and masking layer 1004.

In another embodiment, as illustrated in FIG. 10B, after formation ofthe capping layer 1014 by the electroless alloy deposition 1012, themasking layer 1004 is subsequently removed 1020 from the dielectricportion 1000 thereby removing any unwanted capping layer residue whichmay otherwise have formed over the dielectric portion 1000. In thisfashion, the effective selectivity of the capping layer formation on theconductive portion(s) 1002 relative to the dielectric portion(s) 1000 isimproved. In one embodiment, after removal of the sacrificial maskinglayer 1004, a dielectric barrier layer 1018 (such as silicon nitride,silicon carbide, silicon carbon nitride, etc.) is subsequently formed1022 on top of the capping layer 1014 and dielectric portion(s) 1000.

Thus, the unit process steps involved with the above-referenced approachinclude for example:

1. delivering cleaning solution(s) to remove organic and metalliccontamination from exposed dielectric surfaces;

2. delivering cleaning and/or reducing solution(s) to remove the copperoxide and contamination from exposed copper surfaces;

3. delivering wetting, functionalization, and/or organic coating agentsto form a masking layer on the dielectric portions of the substrate;

4. delivering and effecting a multicomponent (including but limited toCo containing agents, transition metal containing agents, reducingagents, pH adjusters, surfactants, wetting agents, DI water, DMAB, TMAH,etc.) plating chemistry for electroless plating of a Co containing film;

5. delivering post plate etching and/or cleaning solution(s) to removethe sacrificial masking layer whereby excess plating material, such asCo particulates and other unwanted contamination which would otherwisehave formed over the dielectric region(s) are removed through theremoval of the masking layer

6. delivering post cleaning solution(s) to remove contamination and/orexcess plating material, such as Co particulates from the capping layer;

7. rinsing the region; and

8. drying the region.

The site-isolated multiprocessing apparatus described above can be usedto examine variations in each of the unit processes listed above,sequencing of the processes, and combinations thereof such that eachregion of die effectively receives a different process or processinghistory.

Integration of Porous Low-K Dielectrics

This example illustrates a combinatorial processing approach todiscovering new materials/processes/process sequence integration schemesto address the sealing of porous low-k dielectrics used in damascene(single or dual) copper interconnect formation as described inco-pending U.S. patent application Ser. No. 60/630,485, entitled “UsingA Molecularly Self-Assembled Layer To Create A Diffusion Barrier And/OrAdhesion Layer Between Metal And Dielectric Materials”, filed on Nov.22, 2004, the contents of which are herein incorporated by reference intheir entirety. Porous low-k dielectrics are susceptible to precursorpenetration during barrier layer formation such as in atomic layerdeposition (ALD) processes which can lead to poisoning of the low-kdielectric, the inability to form a continuous barrier layer, theinability to form a thin and continuous barrier layer, etc., all ofwhich can subsequently lead to poor device performance. Porous low-kdielectrics also typically exhibit poor (i.e. weaker) adhesioncharacteristics to barrier layers (e.g. Ta, Ta_(x)xC_(y), Ta_(x)N_(y),Ta_(x)C_(y)N_(z), W, W_(x)C_(y), W_(x)N_(y), W_(x)C_(y)N_(z), Ru, etc.)as compared to standard dielectrics (e.g. SiO2, FSG, etc.) which canlead to poor device reliability. It is desirable to be able to seal theexposed pores of porous low-k dielectrics and/or improve the adhesionproperties of porous low-k dielectrics to barrier layers used in copperinterconnect formation.

The unit process steps (involved with the above-referenced approach) forsealing of porous low-k dielectrics used in copper interconnectformation include for example:

1. delivering cleaning solution(s) to remove organic and metalliccontamination from exposed dielectric surfaces;

2. delivering cleaning and/or reducing solution(s) to remove the copperoxide and contamination from exposed copper surfaces;

3. delivering wetting, functionalization, and/or coating agents toselectively form a molecularly self-assembled layer(s) on the exposeddielectric surfaces so as to substantially fill and/or seal the exposedpores of the exposed dielectric surfaces;

4. delivering cleaning solution(s) to remove contamination and/orresidue (resulting from step 3) from exposed copper surfaces;

5. rinsing the region;

6. drying the region; and

7. performing post-processing treatment, e.g. thermal, UV, IR, etc.

The site-isolated multiprocessing methods and systems described in thepresent invention can be used to examine variations in one or more ofthe unit process steps listed above, sequencing of the processes, andcombinations thereof, such that two or more regions of a substrateeffectively receive a different process or sequence of processes, orprocessing history.

The present invention provides greatly improved methods and apparatusfor the differential processing of regions on a single substrate. It isto be understood that the above description is intended to beillustrative and not restrictive. Many embodiments and variations of theinvention will become apparent to those of skill in the art upon reviewof this disclosure. Merely by way of example a wide variety of processtimes, process temperatures and other process conditions may beutilized, as well as a different ordering of certain processing steps.The scope of the invention should, therefore, be determined not withreference to the above description, but instead should be determinedwith reference to the appended claims along with the full scope ofequivalents to which such claims are entitled.

The explanations and illustrations presented herein are intended toacquaint others skilled in the art with the invention, its principles,and its practical application. Those skilled in the art may adapt andapply the invention in its numerous forms, as may be best suited to therequirements of a particular use. Accordingly, the specific embodimentsof the present invention as set forth are not intended as beingexhaustive or limiting of the invention.

1. A system for processing regions on a substrate, the systemcomprising: a substrate comprising an array of discrete regions, whereineach region comprises a plurality of structures and/or devices; and aprocessing tool adapted to process at least one region of the substratedifferently from at least one other region.
 2. The system of claim 1,wherein the processing tool is movable and is adapted to move in atleast one direction relative to the substrate.
 3. The system of claim 1,wherein the substrate is movable and is adapted to move in at least onedirection relative to the processing tool.
 4. The system of claim 1,wherein the processing tool is adapted to isolate a region of thesubstrate from other regions of the substrate during processing of theregion.
 5. The system of claim 1, wherein the processing tool comprisesa processing cell adapted to isolate one region of the substrate fromthe other regions of the substrate.
 6. The system of claim 1, whereinthe processing tool comprises a plurality of processing cells adapted toisolate a plurality of corresponding regions of the substrate from theother regions of the substrate.
 7. The system of claim 6, wherein theprocessing tool comprises a number of processing cells corresponding tothe number of regions on the substrate.
 8. The system of claim 1,further comprising one or more processing fluid sources and a deliverysystem for delivering one or more processing fluids from the one or moresources to a first region on the substrate; a removal system forremoving fluid from the region.
 9. The system of claim 1, furthercomprising a purge gas line for delivering a purge gas to a region ofthe substrate.
 10. The system of claim 1, further comprising amini-environment.
 11. The system of claim 1, wherein the processing toolcomprises one or more processing fluid sources and a plurality ofdelivery systems corresponding to a plurality of processing cells fordelivering one or more processing fluids from the one or more processingfluid sources to regions on the substrate through the processing cells.12. The system of claim 6, further comprising a plurality of removalsystems corresponding to the plurality of processing cells for removingfluids from each region through the processing cells.
 13. The system ofclaim 1, wherein the processing tool includes a sealing element.
 14. Thesystem of claim 1, wherein the plurality of structures and/or devicesare different from each other.
 15. The system of claim 1, wherein eachregion of the substrate is similar to each other region.
 16. The systemof claim 1, wherein the processing tool is adapted to perform at leastone of cleaning, surface modification, surface preparation, deposition,etching, planarization, chemical mechanical planarization,electrochemical mechanical planarization, lithography, patterning,implantation, irradiation, electromagnetic irradiation, microwaveirradiation, radio frequency (RF) irradiation, thermal treatment,infrared (IR) treatment, ultraviolet (UV) treatment, deep ultraviolet(DUV) treatment, extreme ultraviolet (EUV) treatment, electron beamtreatment, and x-ray treatment.
 17. The system of claim 1, wherein theprocessing tool is adapted to modify the regions, wherein modifyingincludes at least one of physical modifications, chemical modifications,electrical modifications, thermal modifications, magnetic modifications,photonic modifications, and photolytic modifications.
 18. The system ofclaim 17, wherein the at least one of physical modifications, chemicalmodifications, electrical modifications, thermal modifications, magneticmodifications, photonic modifications, and photolytic modificationsinclude at least one of cleaning, surface modification, surfacepreparation, deposition, etching, planarization, chemical mechanicalplanarization, electrochemical mechanical planarization, lithography,patterning, implantation, irradiation, electromagnetic irradiation,microwave irradiation, radio frequency (RF) irradiation, thermaltreatment, infrared (IR) treatment, ultraviolet (UV) treatment, deepultraviolet (DUV) treatment, extreme ultraviolet (EUV) treatment,electron beam treatment, and x-ray treatment.
 19. The system of claim18, wherein deposition includes at least one of electrochemicaldeposition, electroless deposition, physical vapor deposition, chemicalvapor deposition, atomic layer deposition, vapor phase epitaxy, liquidphase epitaxy, chemical beam epitaxy, molecular beam epitaxy, molecularself-assembly, and evaporation.
 20. The system of claim 18, wherein themodification includes functionalization of a surface of the region. 21.The system of claim 1, wherein the processing tool is adapted to performat least one of a process, a process sequence, a plurality of processingconditions, a material application sequence, and a plurality of processsequence conditions, wherein the tool is adapted to apply the at leastone of the process, process sequence, processing conditions, materialapplication sequence, and process sequence conditions differently forthe processing in at least one region of the plurality of regions. 22.The system of claim 21, wherein the processing tool is adapted to modifyat least a portion of at least one region using at least one predefinedsequence of modifications.
 23. The system of claim 21, wherein theprocessing tool is adapted to modify at least a portion of a firstregion using a first predefined sequence of modifications and modify atleast a portion of a second region using a second predefined sequence ofmodifications different from the first predefined sequence ofmodifications.
 24. The system of claim 1, wherein the system is adaptedto process each region simultaneously.
 25. The system of claim 1,wherein the system is adapted to process each region sequentially. 26.The system of claim 1, wherein the system is adapted to process at leastfour regions simultaneously.
 27. The system of claim 1, comprising ananalytical tool for determining a property of the regions processed, theproperty including at least one of optical properties, chemicalcomposition, chemical reactivity, electrical properties, physicalproperties, magnetic properties, thermal properties and mechanicalproperties.
 28. The system of claim 27, wherein the analytical tool isadapted to determine a physical property including at least one ofmaterial location, material distribution, material thickness, materialstep coverage, and material continuity.
 29. The system of claim 27,wherein the analytical tool is adapted for parametric testing thatincludes testing for at least one of yield, resistance, leakage, andcapacitance.
 30. The system of claim 29, wherein the testing is foryield, wherein the yield includes at least one of via chain yield andline yield.
 31. The system of claim 29, wherein the testing is forresistance, wherein the resistance includes at least one of viaresistance, line resistance, and Kelvin resistance.
 32. The system ofclaim 27, wherein the analytical tool is adapted to conduct devicetesting.
 33. The system of claim 32, wherein device testing is selectedfrom a group including operational frequency, switching speed, powerdissipation, mobility, transconductance, drive current, thresholdvoltage, capacitance, resistance, and charge density.
 34. The system ofclaim 27, wherein the analytical tool is adapted to conduct reliabilitytesting of the regions that includes testing for at least one of stressmigration, electromigration, bias thermal stress, thermal stress,mechanical stress, environmental stress of at least one environmentalparameter, and time dependent dielectric breakdown.
 35. The system ofclaim 27, wherein the analytical tool is adapted to determine a propertyof each region simultaneously.
 36. The system of claim 27, wherein theanalytical tool is adapted to determine a property of each regionsequentially.
 37. The system of claim 27, wherein the analytical tool isadapted to determine a property of at least four regions simultaneously.38. The system of claim 1, wherein the substrate is selected from agroup including blanket wafers, patterned wafers, substrates includingdevices, substrates including functional chips, substrates includingfunctional devices, and substrates including test structures.
 39. Thesystem of claim 1, wherein the substrate is a single monolithicsubstrate.
 40. The system of claim 1, wherein the substrate is one ofsemiconductor devices, wafers, integrated circuits, flat panel displays,optoelectronic devices, data storage devices, magnetoelectronic devices,magnetooptic devices, molecular electronic devices, solar cells,photonic devices, and packaged devices.
 41. The system of claim 1,wherein the substrate includes at least ten regions.
 42. The system ofclaim 1, wherein the substrate includes at least fifty regions.
 43. Thesystem of claim 1, wherein the substrate includes at least one hundredregions.
 44. The system of claim 1, wherein the processing tool includesa plurality of processing cells and a single sealing element.
 45. Thesystem of claim 1, wherein the processing tool includes a plurality ofsealing elements corresponding to a plurality of processing cells.
 46. Asystem for processing regions on a substrate, the system comprising: asubstrate comprising an array of regions; and a processing tool adaptedto process at least one region of the substrate differently from atleast one other region, wherein the processing tool is adapted toperform one or more of cleaning, surface modification, surfacepreparation, deposition, etching, planarization, chemical mechanicalplanarization, electrochemical mechanical planarization, lithography,patterning, implantation, irradiation, electromagnetic irradiation,microwave irradiation, radio frequency (RF) irradiation, thermaltreatment, infrared (IR) treatment, ultraviolet (UV) treatment, deepultraviolet (DUV) treatment, extreme ultraviolet (EUV) treatment,electron beam treatment, and x-ray treatment.